Vapor Deposition
Advantages: simple equipment, easy to operate.
Defects:
1) Film and substrate bonding strength is insecure, easy to peel;
2) Expensive equipment, complex technology, and not easy to produce large area and uniform oxide film.
Electrochemistry Deposition
Advantages：
1) Easy to prepare large area film;
2) The composition of film can be controlled by controlling the composition of potential (or electric current) and solution;
3) The thickness and surface morphology of the film can be controlled by controlling the electricity using depositing;
4) Simple and safe. It doesn’t need high vacuum, high temperature and dangerous gas.
Defects:
1) The film has loose structure and contains much moisture;
2) The growth and growth speed of the crystal nucleus on the substrate surface can not be controlled, the crystal structure is irregular, and is generally polycrystalline.
Sputtering Method
Advantages：
1) The substrate temperature is low;
2) The prepared films have good crystallinity, and epitaxial single crystal films can be obtained;
3) The film has good properties.
Defects: The growth rate of sputtering is slow, and the composition of the film has a certain deviation from the target.
Sol-gel
Advantages：
1) The composition and doping of the film can be controlled accurately;
2) Easy to prepare large area film, and suitable for mass production, simple equipment, low cost;
3) Compatible with integrated process, suitable for fabricating ferroelectric integrated devices.
Defects:
1) The compactness of the film is poor, and the crazing phenomenon is easy to occur;
2) The process parameters are difficult to master.
If you have any inquires concerning molybdenum products, please do not hesitate to e-mail us by : sales@chinatungsten.com
